HDAP-250D/400D
Arc Plasma Torch Power Supply
The HDAP series uses phase-shifted full-bridge resonant soft-switching and high-precision digital control. It supports MODBUS communication and accurate plasma generation.
Product Details
Performance Features
1. The main circuit uses a full-bridge phase-shift resonant soft-switching inverter, reducing IGBT switching loss and stress while improving reliability. 2. Digital display, digital operation and MCU control provide high control precision. 3. Local, remote analog and RS485 remote digital control modes are supported; remote digital control uses the MODBUS protocol. 4. High-frequency non-contact arc starting provides a high ignition success rate. 5. Complete overload and overheat protection with status display are provided. 6. Preset current display with 1A preset accuracy. 7. Operating current (0.1A accuracy) and operating voltage (0.1V accuracy) are displayed precisely. 8. Duty cycle reaches 100%, supporting continuous 24-hour operation. 9. Successfully applied to high-quality polycrystalline diamond growth with high production efficiency.
Technical Specifications
| Item | HDAP-250D | HDAP-400D |
|---|---|---|
| Rated input voltage | three-phase AC380V ±10% 50Hz | three-phase AC380V ±10% 50Hz |
| Rated input power | 40 KVA | 75 KVA |
| Rated input current | 60 A | 115 A |
| Rated output current | 250 A | 400 A |
| Rated output voltage | 130 V | 150 V |
| Output current range | 50-250 A | 50-400 A |
| Rated no-load voltage | DC 340 V | DC 380 V |
| Rated duty cycle | 100% | 100% |
| Output characteristic | constant current | constant current |
| Control method | IGBT inverter control | IGBT inverter control |
| Ignition mode | high-frequency ignition | high-frequency ignition |
| Cooling method | Forced air cooling | Forced air cooling |
| Insulation class | H | H |
| Enclosure protection | IP21S | IP21S |
| Dimensions (W×H×D) | 330 × 580 × 880 mm | 400 × 800 × 880 mm |
| Weight | 75 kg | 120 kg |
Applications
- Core applications: polycrystalline diamond growth and high-quality diamond film preparation
- General use: plasma generator support, CVD chemical vapor deposition and high-temperature arc heating
- Industrial environments: long-duration continuous production lines and automated integrated control systems